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首页> 外文期刊>Materials express: an international journal on multidisciplinary materials research >Size-Tunable Fabrication of Au Nanodot Arrays via Electrodeposition-Assisted Capillary Force Lithography
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Size-Tunable Fabrication of Au Nanodot Arrays via Electrodeposition-Assisted Capillary Force Lithography

机译:通过电沉积辅助毛细管力光刻技术可调节尺寸的金纳米点阵列的制造。

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摘要

In this paper, we present a facile means of generating size-controllable Au nanodot arrays employing the electrochemically synthesized nanorings of poly(3,4-ethylenedioxythiopene) (PEDOT) within the patterned hole array of polystyrene (PS) template. First, patterned PS array with a diameter of 350 nm is prepared by capillary force lithography. Then, by altering the EDOT monomer concentration, applied potential, or electrodeposition time, PEDOT nanorings with tunable wall thickness are grown inside the PS hole arrays. In addition, by utilizing the nanoholes inside the PEDOT nanorings as a template, Au nanodot arrays with controlled diameter (100~350 nm) can be subsequently fabricated by another electrodeposition process. The successful deposition of Au nanodot arrays is confirmed by localized surface plasmon resonance (LSPR).
机译:在本文中,我们提出了一种在聚苯乙烯(PS)模板的有孔阵列内使用聚(3,4-乙撑二氧噻吩)(PEDOT)的电化学合成纳米环来生成尺寸可控的金纳米点阵列的简便方法。首先,通过毛细管力光刻法制备直径为350nm的图案化PS阵列。然后,通过改变EDOT单体浓度,施加的电势或电沉积时间,可在PS孔阵列内生长具有可调壁厚的PEDOT纳米环。此外,通过利用PEDOT纳米环内部的纳米孔作为模板,可以通过另一种电沉积工艺随后制得直径受控(100〜350 nm)的金纳米点阵列。金纳米点阵列的成功沉积已通过局部表面等离子体共振(LSPR)得到证实。

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