Nanostructured Films of Block Copolymers Functionalized With Photolabile Protected Amino Groups

摘要

Two phase separating block copolymers with photolabile protected amino groups in one block have been synthesized through RAFT polymerization followed by effi cient click modifi cation. Techniques like NMR, GPC, and DSC were applied for the characterization of these functional materials. The block copolymers were used for the preparation of thin fi lms where they assemble to form distinct nanostructures as detected by AFM analysis.