首页> 外文期刊>Fresenius' Journal of Analytical Chemistry >Influence of surface morphology on the oxidation of metal electrodes studied by in-situ grazing incidence x-ray diffractometry
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Influence of surface morphology on the oxidation of metal electrodes studied by in-situ grazing incidence x-ray diffractometry

机译:原位掠入射X射线衍射研究表面形貌对金属电极氧化的影响

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摘要

The successful application of in-situ grazing incidence x-ray diffractometry (GIXD) for the investigation of oxidation processes at copper electrodes in pH 12 electrolytes is demonstrated. A penetration/escape depth of about 1 #mu#m could be detected for a smooth polycrystalline copper foil and an x-ray incidence angle of 1.7 deg. Oxide layers generated at overpotentials less than about 0.5 V in respect to the equilibrium formation potentials of Cu_2O or CuO, respectively, showed a dependence of the crystalline oxide formation on the defect density of the copper substrate. Highly disordered ground or polished specimens exhibited an order of magnitude higher GIXD reflexes from crystalline Cu_2O than electrodeposited copper. Beyond overpotentials of 0.5 V, this epitaxial information of the Cu_2O crystal growth became irrelevant. Further, GIXD turned out to be an appropriate tool to monitor atmospheric corrosion processes under thin humidity films with oxygen access. When oxygen diffusion through the polymer window membrane is allowed, oxygen reduction led to the concurrent formation of a crystalline CuO phase coexisting with amorphous Cu(OH)_2 and Cu_2O, though the potential was kept in the region of Cu_2O.
机译:证明了原位掠入射X射线衍射法(GIXD)在研究pH为12的电解液中铜电极上的氧化过程中的成功应用。对于光滑的多晶铜箔和X射线入射角为1.7度,可以检测到大约1#μm的穿透/逸出深度。相对于Cu_2O或CuO的平衡形成电势,在小于约0.5V的过电势下产生的氧化物层显示出结晶氧化物的形成对铜基板的缺陷密度的依赖性。高度无序的研磨或抛光试样比结晶铜呈现出更高的数量级,其来自晶体Cu_2O的GIXD反射。超过0.5 V的过电势,Cu_2O晶体生长的外延信息变得无关紧要。此外,事实证明,GIXD是监测在有氧气进入的潮湿薄膜下的大气腐蚀过程的合适工具。当允许氧扩散通过聚合物窗膜时,尽管电势保持在Cu_2O区域中,但氧还原导致同时形成与非晶Cu(OH)_2和Cu_2O共存的结晶CuO相。

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