首页> 外文期刊>Japanese journal of applied physics >Surface morphology of vacuum-evaporated pentacene film on Si substrate studied by in situ grazing-incidence small-angle X-ray scattering: I. The initial stage of formation of pentacene film
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Surface morphology of vacuum-evaporated pentacene film on Si substrate studied by in situ grazing-incidence small-angle X-ray scattering: I. The initial stage of formation of pentacene film

机译:通过原位掠入射小角X射线散射研究Si衬底上真空蒸镀并五苯薄膜的表面形貌:I.并五苯薄膜形成的初始阶段

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摘要

The progress of the surface morphology of a growing sub-monolayered pentacene film on a Si substrate was studied by in situ grazing-incidence small angle X-ray scattering (GISAXS). The observed GISAXS profiles did not show sizes of pentacene islands but mainly protuberances on the boundaries around pentacene film. Scattering of X-ray by residual pits in the pentacene film was also detected in the GISAXS profiles of an almost fully covered film. The average radius of pentacene protuberances increased from 13 to 24 nm as the coverage increased to 0.83 monolayer, and the most frequent radius was almost constant at approximately 9 nm. This result suggests that the population of larger protuberances increase with increasing lengths of boundaries of the pentacene film. It can also be considered that the detected protuberances were crystallites of pentacene, since the average size of protuberances was nearly equal to crystallite sizes of pentacene films. The almost constant characteristic distance of 610 nm and amplitudes of pair correlation functions at low coverages suggest that the growth of pentacene films obeyed the diffusion-limited aggregation (DLA) model, as previously reported. It is also considered that the sites of islands show a triangular distribution for small variations of estimated correlation distances. (C) 2018 The Japan Society of Applied Physics
机译:通过原位掠入射小角X射线散射(GISAXS)研究了在Si衬底上生长的亚单层并五苯膜的表面形貌进展。观测到的GISAXS剖面没有显示并五苯岛的大小,但主要是并五苯薄膜周围边界上的凸起。在几乎完全覆盖的薄膜的GISAXS轮廓中也检测到并五苯薄膜中残留凹坑对X射线的散射。随着覆盖率增加到0.83单层,并五苯突起的平均半径从13 nm增加到24 nm,最常见的半径几乎恒定在大约9 nm。该结果表明,随着并五苯膜的边界长度的增加,大突起的数量增加。也可以认为检测到的突起是并五苯的微晶,因为突起的平均尺寸几乎等于并五苯薄膜的微晶尺寸。如前所述,在低覆盖率下,几乎恒定的610 nm特征距离和成对相关函数的幅度表明并五苯薄膜的生长遵循扩散限制聚集(DLA)模型。还认为对于估计的相关距离的微小变化,岛的位置显示出三角形分布。 (C)2018日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2018年第3s2期|03EG12.1-03EG12.6|共6页
  • 作者单位

    Japan Synchrotron Radiat Res Inst, Ind Applicat Div, Sayo, Hyogo 6795198, Japan;

    Japan Synchrotron Radiat Res Inst, Ind Applicat Div, Sayo, Hyogo 6795198, Japan;

    Japan Synchrotron Radiat Res Inst, Ind Applicat Div, Sayo, Hyogo 6795198, Japan;

    Iwate Univ, Facil Sci & Engn, Morioka, Iwate 0200066, Japan;

    Iwate Univ, Facil Sci & Engn, Morioka, Iwate 0200066, Japan;

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