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首页> 外文期刊>Fluctuation and Noise Letters: FNL: An Interdisciplinary Scientific Journal on Random Processes in Physical, Biological and Technological Systems >Effects of Hot-Carrier Stress on the RF Performance of a 0.18-μm MOS Divide-by-4 LC Injection-Locked Frequency Divider
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Effects of Hot-Carrier Stress on the RF Performance of a 0.18-μm MOS Divide-by-4 LC Injection-Locked Frequency Divider

机译:热载流应力对0.18μmMOS除以4 LC注入锁定分频器的RF性能的影响

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摘要

The effect of ac hot-carrier stress on the performance of a wide locking range divide-by-4 injection-locked frequency divider (ILFD) is investigated. The ILFD was implemented in the TSMC 0.18μm 1P6M CMOS process. The ILFD uses direct injection MOSFETs for coupling external signal to the resonators. Radio frequency (RF) circuit parameters such as oscillation frequency, tuning range, phase noise, and locking range before and after RF stress at an elevated supply voltage for 5 h have been examined by experiment. The measured locking range, operation range and phase noise after RF stress shows significant degradation from the fresh circuit condition.
机译:研究了交流热载流应力对宽锁定范围除以4注入锁定分频器(ILFD)性能的影响。 ILFD是在TSMC0.18μm1P6M CMOS工艺中实现的。 ILFD使用直接注入MOSFET将外部信号耦合到谐振器。通过实验检查了射频(RF)电路参数,例如在升高的电源电压下持续5 h的RF应力前后的振荡频率,调谐范围,相位噪声和锁定范围。 RF应力后测得的锁定范围,工作范围和相位噪声显示出由于新电路条件而导致的明显劣化。

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