首页> 外文期刊>Canadian Journal of Chemistry >Synthesis and X-ray photoelectron spectroscopy (XPS) and thermoelectric studies of ternary Bi2(Te_(0.5)8e_(0.5))3 mixed-metai chalcogenide thin films by the arrested precipitation technique
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Synthesis and X-ray photoelectron spectroscopy (XPS) and thermoelectric studies of ternary Bi2(Te_(0.5)8e_(0.5))3 mixed-metai chalcogenide thin films by the arrested precipitation technique

机译:三元Bi2(Te_(0.5)8e _((0.5))3混合Metai硫族化物薄膜的合成,X射线光电子能谱和热电学研究

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摘要

Arrested precipitation technique (APT) has been successfully employed for the deposition of Bi2(Te_(0.5)Se_(0.5))3 thin films. Analytical grade bismuth nitrate complexes with triethanolamine (TEA), sodium tellurosulfite, and sodium selenosul-fite were used as precursor materials. The film was obtained at 55 ± 0.5 °C in an aqueous alkaline medium (pH = 10.5 ± 0.2). As-deposited film was characterized by chemical compositional, optical, and electrical analyses. The optical absorption spectrum for the sample was recorded in the wavelength region 400-900 nm. It shows a high coefficient of absorption (α = 10~5 cm~(-1)) with an allowed direct type of transition. X-ray diffraction (XRD) study of the film shows a nanocrystalline and rhombohedral structure. From scanning electron microscopy (SEM), atomic force microscopy (AFM), and energy dispersive X-ray analysis (EDAX) studies, the deposited film shows uniform morphology and good stoichiometry. X-ray photoelectron spectroscopy (XPS) was used to study the binding energy and surface oxidation of the material. Electrical conduction study shows that material is an n-type semiconductor and shows good thermoelectric figure of merit.
机译:逮捕沉淀技术(APT)已成功地用于Bi2(Te_(0.5)Se_(0.5))3薄膜的沉积。分析级硝酸铋与三乙醇胺(TEA),亚碲酸钠和硒代亚硒酸钠的络合物用作前体材料。在55±0.5°C的碱性水溶液中(pH = 10.5±0.2)获得薄膜。沉积膜的特征在于化学成分,光学和电学分析。在400-900nm的波长范围内记录样品的光吸收光谱。它显示出高吸收系数(α= 10〜5 cm〜(-1)),并允许直接过渡。薄膜的X射线衍射(XRD)研究显示出纳米晶和菱面体结构。通过扫描电子显微镜(SEM),原子力显微镜(AFM)和能量色散X射线分析(EDAX)研究,沉积膜显示出均匀的形态和良好的化学计量。 X射线光电子能谱(XPS)用于研究材料的结合能和表面氧化。导电性研究表明材料是n型半导体,并显示出良好的热电性能。

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