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首页> 外文期刊>Ferroelectrics: Letters Section >Microscale Patterning of Mesoscopic PZN-PT Single Crystal Films by Crystal ion Slicing and Laser-Induced Etching
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Microscale Patterning of Mesoscopic PZN-PT Single Crystal Films by Crystal ion Slicing and Laser-Induced Etching

机译:通过晶体离子切片和激光诱导刻蚀对介观PZN-PT单晶膜进行微尺度构图

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摘要

Advances in the fabrication of solid-solution single crystal relaxor ferroelectrics have made it possible to produce highly efficient piezoelectric crystals, and have attracted renewed interest in the use of these crystals for a new generation of piezoelectric transducers, actuators and sensors. Of particular interest is their incorporation into micro-electromechanical systems (MEMS). In this paper we report on the laser-induced wet chemical etching of lead zinc niobate-lead titanate (PZN-PT) in hydrochloric acid (HCl). Argon-ion laser radiation at power levels up to 4 W is focused to a spot diameter of about 15 (mu)m and results in the chemical etching of grooves at patterning speeds up to 5 (mu)m/sec. Crystal ion slicing, an ion-implant-based film separation technique, is used in combination with laser etching to form 5 to 10 (mu)m-thick patterned and freestanding films for incorporation into micro-electromechanical devices.
机译:固溶单晶弛豫铁电体的制造进展使得生产高效压电晶体成为可能,并且对于将这些晶体用于新一代压电换能器,致动器和传感器引起了新的兴趣。特别感兴趣的是将它们结合到微机电系统(MEMS)中。在本文中,我们报告了在盐酸(HCl)中激光诱导的铌酸铅锌-钛酸铅(PZN-PT)的湿法化学蚀刻。功率水平高达4 W的氩离子激光辐射聚焦到约15μm的光斑直径,并以高达5μm/ sec的图案化速度对沟槽进行化学蚀刻。晶体离子切片是一种基于离子注入的膜分离技术,与激光蚀刻结合使用,可形成5至10μm厚的图案化和自立式膜,以用于微机电设备中。

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