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Ferroelectric Properties of BiFeO_3 Thin Films Prepared via a Simple Chemical Solution Deposition

机译:通过简单化学溶液沉积制备的BiFeO_3薄膜的铁电性能

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摘要

Bi_(1+x)FeO_3 (BFO, x = 0,0.05,0.1,0.15) thin films are fabricated on LaNiO_3 (LNO) buffered Si substrates by using a polymeric precursor solution under appropriate crystallization condition. All films possess highly (100) preference oriented. SEM analyses show that the average grain size decreases and thin films become dense and smoother with increasing of excess Bi content. The enhancement of polarization and improvement of leakage current are observed for BFO thin films with 10% excess Bi content. It indicates that the optimized excess Bi content plays an important role in the microstructure and ferroelectric property for BFO thin films.
机译:通过在适当的结晶条件下使用聚合物前驱体溶液,在LaNiO_3(LNO)缓冲的Si衬底上制备Bi_(1 + x)FeO_3(BFO,x = 0,0.05,0.1,0.15)薄膜。所有电影都具有高度(100)偏好取向。 SEM分析表明,随着过量Bi含量的增加,平均晶粒尺寸减小,薄膜变得致密光滑。对于Bi含量超过10%的BFO薄膜,可以观察到极化的增强和漏电流的改善。这表明优化的过量Bi含量在BFO薄膜的微结构和铁电性能中起着重要作用。

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