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Reaction of NO on Vanadium Oxide Surfaces:Observation of the NO Dimer Formation

机译:NO在氧化钒表面上的反应:观察NO二聚体的形成

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The adsorption and surface reactions of NO on a VO/V(110) surface have been investigated using X-ray photoelectron spectroscopy (XPS),near-edge X-ray absorption fine structure,and temperature programmed desorption (TPD) technique.NO is molecularly adsorbed on VO/V(l 10) at 80 K.As the surface coverage of NO increases,the NO dimer is formed on the surface at 80 K.Both NO and (NO)2 are adsorbed on the surface with the N-O bond perpendicular to the surface.(NO)2 decomposes at ~100 K and the reaction product is desorbed as N2O.Decomposition of NO takes place when the surface temperature is higher than 273 K.
机译:利用X射线光电子能谱(XPS),近缘X射线吸收精细结构和程序升温解吸(TPD)技术研究了VO / V(110)表面上NO的吸附和表面反应。分子在80 K时吸附在VO / V(l 10)上。随着NO的表面覆盖率增加,在80 K时在表面形成NO二聚体.NO和(NO)2都通过NO键被吸附在表面上(NO)2在〜100 K时分解,反应产物以N2O的形式解吸。当表面温度高于273 K时,NO分解。

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