Line Patterning using a Scanning Probe Lithography Technique based on Convolution Method

摘要

In this article, we report the development of a fabrication process for predictable line patterns. The proposed process uses two control parameters: the tip speed and step size, with the convolution method. From the oxidation curves, we choose the two oxidation parameters: bias voltage and oxidation time. Given a desired line pattern, these oxidation parameters are then used for calculating the control parameters. The step size is determined by the width of the nanodot profile, and the tip speed is calculated using the step size and the oxidation time. As the overlapping of exposure area happens because of the nanodots located densely, the electrochemical reaction is continuously activated during the line lithography process in the overlapped area so that the amount of overlap can be estimated with the convolution method. From experimental results with a commercial atomic force microscope, we verified that our method is effective in fabricating nanoline patterns.