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首页> 外文期刊>Bulletin of the Russian Academy of Sciences. Physics >Epitaxial films of GeSi, AlGaN, and GaSb and GaSb/InAs superlattices on substrates of fianite
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Epitaxial films of GeSi, AlGaN, and GaSb and GaSb/InAs superlattices on substrates of fianite

机译:萤石衬底上的GeSi,AlGaN,GaSb和GaSb / InAs超晶格外延膜

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摘要

Fianite is a single crystal of cubic solid solutions based on zirconium dioxide (ZrO_2) or hafnium dioxide (HfO_2) with stabilizing oxides of yttrium, scandium, and lanthanides. It is characterized by a unique combination of physical and chemical properties, making it a promising material for wide use in electronics. In this work, we consider new uses of fianite as a monolith substrate for obtaining Ge, GeSi, AlGaN, and GaSb epitaxial films and GaSb/InAs superlattices.
机译:ian铁矿是基于二氧化锆(ZrO_2)或二氧化ha(HfO_2)的立方固溶体的单晶,具有稳定的钇,scan和镧系元素氧化物。它的特点是物理和化学性质的独特结合,使其成为广泛用于电子领域的有前途的材料。在这项工作中,我们考虑了用铁矿作为整体衬底的新用途,以获得Ge,GeSi,AlGaN和GaSb外延膜以及GaSb / InAs超晶格。

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