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首页> 外文期刊>Bulletin of the Lebedev Physics Institute >Multiplicity of Charged Particles in Electron-Induced Showers Developing in Oriented Silicon and Tungsten Crystals
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Multiplicity of Charged Particles in Electron-Induced Showers Developing in Oriented Silicon and Tungsten Crystals

机译:定向硅和钨晶体中电子诱导簇射中带电粒子的多样性

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摘要

A more than twofold increase in the average multiplicity of charged particles in electromagnetic showers initiated by electrons with an energy of 26 GeV in tungsten crystals 2.7, 5.8, and 8.4 mm thick, oriented along the〈111〉axis, in comparison with misoriented crystals is shown. For a silicon crystal 20 mm thick, oriented along the〈110〉axis, at an electron energy of 28 GeV, the average multiplicity of charged particles increases by a factor of ~1.6. The widths of the orientation dependences of the average multiplicity of charged particles in electron-induced showers in silicon and tungsten crystals are proportional to the crystal thickness and depend on the electron energy as E?1/2.
机译:与取向不正确的晶体相比,在沿<111>轴取向的厚度为2.7、5.8和8.4 mm的钨晶体中,由能量为26 GeV的电子引发的电磁辐射中带电粒子的平均多重度增加了两倍以上如图所示。对于沿& 110&轴取向的20毫米厚的硅晶体,在28 GeV的电子能量下,带电粒子的平均多重度增加了约1.6倍。在硅和钨晶体中的电子感应簇射中,带电粒子的平均多样性的取向依赖性的宽度与晶体厚度成比例,并且取决于电子能量,为Eπ1/ 2。

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