MANUFACTURE OF GRAIN ORIENTED SILICON STEEL SHEET HAVING THIN THICKNESS AND HIGH SILICON AND DEVELOPING ZAFFRE AGGREGATE STRUCTURE BY WARM-ROLLING HAVING HIGH ROLLING REDUCTION RATIO JUST BELOW RECRYSTALLIZING TEMPERATURE AND GRAIN ORIENTED SILICON STEEL SHEET HAVING THIN THICKNESS AND HIGH SILICON MANUFACTURED BY THIS MANUFACTURING METHOD

摘要

PURPOSE: To manufacture a grain oriented silicon steel sheet having thin thickness and high silicon by warm-rolling just below the recrystallizing temp. ;CONSTITUTION: A base stock containing 3.3-4.5% silicon content and MnS AlN and as inhibitor or a base stock containing 3.3-4.5% silicon content and MnS and AlN an inhibitor and further adding alloy element of tin, etc., in order to improve the inhibitor effect, is finished to 1.5-2.5mm sheet thickness by hot-rolling. To this working, the warm-rolling is applied in the range of 80-95% at below the recrystallizing temp. by 10-400C according to the silicon content and the rolling reduction ratio to sufficiently secure the neucleus generating site of zaffre orientation in the working condition. By this method, the vol. ratio of (110)[001] oriented crystal grain after primary crystallization is increased and to the high silicon content thin material being impossible to realize in the ordinary method, the development of the sharp zaffre aggregate structure after secondary recrystallizing annealing can be realized.;COPYRIGHT: (C)1994,JPO&Japio