Ozone etching of a highly asymmetric triblock copolymer with a majority polydiene component

摘要

The ozone etching of thin films of a commercial polystyrene-polyisoprene-polystyrene (PS-PI-PS) triblock copolymer (Vector 4111) was studied using atomic force microscopy (AFM) and ellipsometry. The major phase of the copolymer consists of PI (82 wt.%) and the copolymer forms a cylindrical structure upon annealing. Moderate ozone doses (1.4% wt/wt) were used to etch the copolymer. This revealed two stages of the ozonation: rapid etching of the PI fragments followed by slow compacting of the remaining PS cylinders. Under certain conditions ozone treatment results in the formation of nanosized grooves in a PS matrix which is suitable for lithographic processes. (C) 2004 Elsevier Ltd. All rights reserved.