Polysiloxane formation at the irradiated surface of polymers containing both photoacid generating units and epoxy units

摘要

Polymers bearing both epoxy units and photoacid generating units which can generate sulfonic acid upon irradiation with 254 nm light were prepared and the effect of crosslinking of polymer films on the formation of polysiloxanes at the irradiated surface by the chemical vapor deposition (CVD) method was investigated. When the surface of the irradiated film was exposed to the vapor of alkoxysilanes, polysiloxanes were formed at the surface. The thickness of the surface layer composed of polysiloxanes and base polymer was largely reduced by the crosslinking of the film surface. The surface modified with polysiloxanes showed a good resistance to the etching using an oxygen plasma. (C) 1997 Elsevier Science Ltd.