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首页> 外文期刊>Bulletin of Materials Science >Effect of gamma radiation on optical and electrical properties of tellurium dioxide thin films
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Effect of gamma radiation on optical and electrical properties of tellurium dioxide thin films

机译:γ辐射对二氧化碲薄膜光学和电学性质的影响

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摘要

Gamma radiation induced changes in the optical and electrical properties of tellurium dioxide (TeO_2) thin films, prepared by thermal evaporation, have been studied in detail. The optical characterization of the as-deposited thin films and that of the thin films exposed to various levels of gamma radiation dose clearly show that the optical bandgap decreases with increase in the gamma radiation dose up to a certain dose. At gamma radiation doses above this value, however, the optical bandgap has been found to increase. On the other hand, the current vs voltage plots for the as-deposited thin films and those for the thin films exposed to various levels of gamma radiation dose show that the current increases with the gamma radiation dose up to a certain dose and that the value of this particular dose depends upon the thickness of the film. The current has, however, been found to decrease with further increase in gamma radiation dose. The observed changes in both the optical and electrical properties indicate that TeO_2 thin films can be used as the real time gamma radiation dosimeter up to a certain dose, a quantity that depends upon the thickness of the film.
机译:详细研究了通过热蒸发制备的伽马射线引起的二氧化碲(TeO_2)薄膜的光学和电学性质的变化。沉积的薄膜的光学特性和暴露于各种水平的伽马辐射剂量的薄膜的光学特性清楚地表明,光学带隙随着伽马辐射剂量的增加而增加,直到一定剂量。然而,在高于该值的伽马辐射剂量下,发现光学带隙增加。另一方面,沉积后的薄膜和暴露于不同水平的伽马辐射剂量的薄膜的电流-电压图表明,电流随伽马辐射剂量增加到一定剂量而增加具体剂量的多少取决于膜的厚度。然而,已经发现电流随着γ辐射剂量的进一步增加而减小。所观察到的光学和电学性质的变化表明,TeO_2薄膜可以用作实时伽马辐射剂量计,直至一定剂量,该剂量取决于薄膜的厚度。

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