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Effects of void-crack interaction and void distribution on crack propagation in single crystal silicon

机译:空隙-裂纹相互作用和空隙分布对单晶硅中裂纹扩展的影响

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Interaction between crack and pre-existing voids in single crystal silicon has been investigated by performing molecular dynamics simulation. It is found that the presence of a single void, ahead of crack tip, can affect the crack propagation through crack-void interaction in one-void model. As the crack-void ligament distance gradually approaches the critical distance, the crack propagation speed decreases. For two-void model, crack propagation behaviors can be substantially influenced by voids distributions (voids aligned along or perpendicular to crack line) under different crack retarding mechanisms, indicating that the distribution of voids provides a prominent role in blocking the crack propagation. (C) 2015 Elsevier Ltd. All rights reserved.
机译:通过进行分子动力学模拟,研究了单晶硅中裂纹与预先存在的空隙之间的相互作用。结果发现,在单孔模型中,裂纹尖端之前存在单个空隙会通过裂纹与空隙的相互作用影响裂纹的扩展。随着无裂纹韧带距离逐渐接近临界距离,裂纹扩展速度降低。对于两气孔模型,在不同的裂纹延迟机制下,气孔分布(沿裂纹线或垂直于裂纹线对齐的气孔)会严重影响裂纹的扩展行为,这表明,气孔的分布在阻止裂纹扩展方面起着重要作用。 (C)2015 Elsevier Ltd.保留所有权利。

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