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首页> 外文期刊>Electrochimica Acta >Nanocrystalline-diamond thin films with high pH and penicillin sensitivity prepared on a capacitive Si-SiO_2 structure
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Nanocrystalline-diamond thin films with high pH and penicillin sensitivity prepared on a capacitive Si-SiO_2 structure

机译:在电容性Si-SiO_2结构上制备具有高pH和青霉素敏感性的纳米晶金刚石薄膜

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摘要

A capacitive field-effect EDIS (electrolyte-diamond-insulator-semiconductor) sensor with improved pH and penicillin sensitivity has been realised using a nanocrystalline-diamond (NCD) film as sensitive gate material. The NCD growth process on SiO_2 as well as an additional surface treatment in oxidising medium have been optimised to provide high pH-sensitive, non-porous O-terminated films without damage of the underlying SiO_2 layer. The surface morphology of O-terminated NCD thin films and the layer structure of EDIS sensors have been studied by scanning electron microscopy (SEM) and transmission electron microscopy (TEM) methods. To establish the relative coverage of the surface functional groups generated by the oxidation of NCD surfaces, X-ray photoelectron spectroscopy analysis was carried out. The hydrophilicity of NCD thin films has been studied by water contact-angle measurements. A nearly Nernstian pH sensitivity of 54-57 mV/pH has been observed for O-terminated NCD films treated in an oxidising boiling mixture for 80 min and in oxygen plasma. The high pH-sensitive properties of O-terminated NCD have been used to develop an EDIS-based penicillin biosensor. A freshly prepared penicillin biosensor possesses a high sensitivity of 85 mV/decade in the concentration range of 0.1-2.5 mM penicillin G. The lower detection limit is 5 μM.
机译:使用纳米晶金刚石(NCD)膜作为敏感栅材料,已经实现了具有改善的pH和青霉素敏感性的电容性场效应EDIS(电解质-金刚石-绝缘体-半导体)传感器。 SiO_2上的NCD生长过程以及在氧化介质中的附加表面处理已得到优化,以提供对pH敏感的,无孔的O端膜,而不会损坏下面的SiO_2层。通过扫描电子显微镜(SEM)和透射电子显微镜(TEM)方法研究了O端NCD薄膜的表面形貌和EDIS传感器的层结构。为了建立由NCD表面的氧化产生的表面官能团的相对覆盖,进行了X射线光电子能谱分析。 NCD薄膜的亲水性已通过水接触角测量进行了研究。对于在氧化沸腾混合物中处理了80分钟并在氧等离子体中处理过的O端NCD膜,观察到接近Nernstian pH敏感度为54-57 mV / pH。 O端NCD的高pH敏感特性已用于开发基于EDIS的青霉素生物传感器。新鲜制备的青霉素生物传感器在0.1-2.5 mM青霉素G的浓度范围内具有85 mV /十年的高灵敏度。下限为5μM。

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