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首页> 外文期刊>Electrochimica Acta >Metastable and stable pitting events on Al induced by chlorate and perchlorate anions - Polarization, XPS and SEM studies
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Metastable and stable pitting events on Al induced by chlorate and perchlorate anions - Polarization, XPS and SEM studies

机译:由氯酸根和高氯酸根阴离子引起的亚稳和稳定的点蚀事件-极化,XPS和SEM研究

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The metastable and stable pitting events of Al were studied in 0.075 M deaerated acidic NaClO{sub}3 and NaClO{sub}4 solutions (pH 3) using potentiodynamic anodic polarization and potentiostatic measurements, complemented with SEM and XPS examinations of the electrode surface. Metastable pits (appeared here as oscillations in current in the nA range) form at potentials close to the pitting potential (E{sub}(pit)). SEM examinations of the electrode surface showed that the current oscillations resulted in observable pits on sample surface. The repassivated metastable pitting sites are prone to become preferential sites for following metastable pits to nucleate, resulting in accumulated corrosion damages on the surface. Results showed that Cl{sup}- ions produced in solution via the reduction of ClO{sub}3{sup}- and ClO{sub}4{sup}- anions at sufficiently negative cathodic potentials as well as their decomposition at high anodic potentials. Chloride production induced via the reduction of perchlorates is much slower than induced by chlorates. XPS examinations of the electrode surface showed that the amount of ClO{sub}4{sup}- and Cl{sup}- anions detected on the electrode surface increases with both cathodic and anodic polarizations (even above E{sub}(pit)). Experimental results revealed that addition of Cl{sup}- ions to the ClO{sub}4{sup}- solution accelerates pitting corrosion, indicating that these anions cooperate together in passivity breakdown and initiation of pitting. The role of ClO{sub}3{sup}- and ClO{sub}4{sup}- ions, despite their large size, in pitting process is also discussed here. A point defect model (PDM) is employed to explain passivity breakdown induced by pitting corrosion as a result of the aggressive attack of Cl{sup}- ions.
机译:使用电位动力学阳极极化和恒电位测量,并在电极表面进行SEM和XPS检查,在0.075 M脱气的酸性NaClO {sub} 3和NaClO {sub} 4溶液(pH 3)中研究了Al的亚稳和稳定点蚀事件。亚稳凹坑(此处显示为nA范围内的电流振荡)在接近凹坑电位(E {sub}(pit))的电位处形成。电极表面的SEM检查表明,电流振荡导致样品表面出现可观察到的凹坑。重新钝化的亚稳点蚀点易于成为随后的亚稳点成核的优先点,从而导致表面累积的腐蚀破坏。结果表明,通过在足够负的阴极电势下还原ClO {sub} 3 {sup}-和ClO {sub} 4 {sup}-阴离子以及在高阳极电势下它们的分解,溶液中产生的Cl {sup}-离子。通过减少高氯酸盐引起的氯化物生成要慢于通过氯酸盐引起的氯化物生成。 XPS对电极表面的检查表明,在电极表面上检测到的ClO {sub} 4 {sup}-和Cl {sup}-阴离子的数量均随阴极和阳极极化而增加(甚至高于E {sub}(凹坑))。 。实验结果表明,向ClO {sub} 4 {sup}-溶液中添加Cl {sup}-离子可加速点蚀,表明这些阴离子在钝化击穿和点蚀引发中共同起作用。 ClO {sub} 3 {sup}-和ClO {sub} 4 {sup}-离子尽管尺寸很大,但在点蚀过程中也发挥了作用。使用点缺陷模型(PDM)来解释由于Cl {sup}-的侵蚀引起的点蚀所导致的钝化破坏。

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