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Photoelectrochemical Determination of the Flatband Potential of Boron-Doped Diamond

机译:光电化学法测定掺硼金刚石的平坦带电势

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摘要

Flatband potentials of boron-doped polycrystalline and single crystal chemical vapor deposition and high-temperature, high-pressure diamond electrodes were estimated by three photoelectrochemical methods (i) as the photocurrent onset potential, (ii) from the dependence of photopotential on the light intensity, and (iii) by extrapolating the potential dependence of the photocurrent squared. The potentialities of these methods are discussed, as applied to diamond electrodes.
机译:通过三种光电化学方法(i)作为光电流开始电势(ii)根据光势对光强度的依赖性,估算了掺硼多晶和单晶化学气相沉积以及高温高压金刚石电极的平带电势(iii)外推光电流平方的电势依赖性。讨论了这些方法在应用于金刚石电极时的潜力。

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