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Reduction Mechanism of 0_2 in DMSO and Metal Oxide Thin Film Formation: CdO Case Study

机译:DMSO中0_2的还原机理和金属氧化物薄膜形成:CdO案例研究

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摘要

The electrochemical reduction of O_2 in a dimethyl sulfoxide (DMSO) solution onto a glassy carbon substrate at 423 K has been studied. Electrochemical potentiodynamic studies show that the reduction process is controlled by O_2 diffusion and reveal a two-step mechanism. The first one corresponds to an electrochemical step which gives the superoxide ion that, in a second chemical step, forms the peroxide ions through a disproportion reaction. The proposed mechanism can be used for the formation of semiconductor CdO thin films. Here, results for CdO film formation, obtained in a direct way without the presence of Cd(OH)_2 mixtures, are presented.
机译:研究了在423 K下二甲基亚砜(DMSO)溶液中O_2在玻璃碳基底上的电化学还原。电化学电位动力学研究表明,还原过程受O_2扩散控制,并揭示了两步机理。第一个对应于提供超氧化物离子的电化学步骤,在第二化学步骤中,该超氧化物离子通过歧化反应形成过氧化物离子。所提出的机制可用于半导体CdO薄膜的形成。在此,给出了在没有Cd(OH)_2混合物的情况下以直接方式获得的CdO成膜结果。

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