Production manner null of constituent and its production manner for metallic oxide thin film pattern formation, formation manner and electronic parts and optical part of metallic oxide thin film

摘要

PURPOSE: To efficiently form a metal oxide thin film pattern with photoirradiation of low energy at the time of forming the pattern by a sol-gel method. ;CONSTITUTION: This metal oxide thin film pattern forming composition contains 0.05-6mols of a nitrobenzyl alcohol derivative and/or a nitrobenzaldehyde derivative per mol of a metal alkoxide. The composition is applied on a substrate, irradiated with light and patterned by utilizing the solubility difference between the light-irradiated part due to the photolysis reaction of the irradiated part and the unirradiated part. The nitrobenzyl alcohol derivative or nitrobenzaldehyde derivative reacts easily with the metal alkoxide to form a metallic compd. high in photochemical reactivity. The metallic compd. decomposes easily on absorbing light to form a metallic compd. with the solubility greatly different from that of the original metal alkoxide, and hence a large solubility difference is obtained with a small amt. of irradiation energy.;COPYRIGHT: (C)1996,JPO