Conformality of Pb(Zr,Ti)O_3 Films Deposited on Trench Structures Having Submicrometer Diameter and Various Aspect Ratios

摘要

Pb(Zr,Ti)O_3 films were deposited at 540 deg C on trenched substrates with submicrometer diameters by pulsed-metallorganic chemical vapor deposition. The respective fluctuations of Pb/(Zr + Ti) and Zr/(Zr + Ti) molar ratios were in a range of +-19 and +- 17 percent from each average value at the sidewalls of trenches with a diameter of 200 nm and a depth of 685 nm (aspect ratio of 3.4). The sidewall-bottom step coverage was successfully maintained above 70 percent up to a depth of 685 nm. The present results show the possibility of uniform Pb(Zr,Ti)O_3 film deposition on the trench substrates with high aspect ratio.