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Annealing study of electrodeposited CuInSe2 and CuInS2 thin films

机译:电沉积CuInSe2和CuInS2薄膜的退火研究

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摘要

In this study CuInSe2 and CuInS2 thin films were prepared onto ITO glass substrate using the electrodeposition technique in aqueous solution. The electrodeposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM) and energy dispersive X-ray analysis. The annealing effects on electrodeposited precursors were investigated. The chalcopyrite structure of CuInSe2/CuInS2 showed an enhancement of crystallinity after subsequent selenization/sulfurization treatment in Se/S atmosphere, respectively. XRD and SEM studies revealed a dramatic improvement of the crystalline quality of CIS films after annealing treatments. Mott-Schottky measurements were used to assess the conductivity type of the films and their carrier concentration. The prepared samples underwent an etching process to remove the binary accumulated Cu2-x(Se,S) phases shown in FESEM pictures. This etching process has shown a noticeable decrease in both, the flat band potential, V (fb) (V), and the number of acceptors, N (A) (cm(-3)) in selenized CuInSe2 and sulfurized CuInS2 samples.
机译:本研究采用电沉积技术在水溶液中制备了CuInSe2和CuInS2薄膜。采用X射线衍射(XRD)、扫描电子显微镜(SEM)和能量色散X射线分析等手段对电沉积膜进行了表征。研究了退火对电沉积前驱体的影响。CuInSe2/CuInS2的黄铜矿结构在Se/S气氛中经过硒化/硫化处理后,结晶度均有所增强。XRD和SEM研究显示,退火处理后CIS薄膜的结晶质量显著提高。Mott-Schottky 测量用于评估薄膜的电导率类型及其载流子浓度。制备的样品经过蚀刻过程,以去除FESEM图片中所示的二元累积Cu2-x(Se,S)相。在硒化CuInSe2和硫化CuInS2样品中,这种蚀刻过程显示出平坦带电位V(fb)(V)和受体数量N(A)(cm(-3))的明显减少。

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