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首页> 外文期刊>ECS Journal of Solid State Science and Technology >Hyperspectral Electroluminescence Characterization of OFF-State Device Characteristics in Proton Irradiated High Voltage AlGaN/GaN HEMTs
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Hyperspectral Electroluminescence Characterization of OFF-State Device Characteristics in Proton Irradiated High Voltage AlGaN/GaN HEMTs

机译:质子辐照高压AlGaN / GaN HEMT中关态器件特性的高光谱电致发光特性

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摘要

Gallium nitride-based high electron mobility transistors (HEMTs) represent a critical next-generation technology for RF amplifiers. In this work, we implement electroluminescence (EL) imaging to study breakdown mechanisms under high voltage stress conditions in as-fabricated and proton irradiated devices. After irradiation, an increased breakdown voltage and reduced buffer leakage was observed and attributed to the formation of a back barrier structure due to carrier type conversion in the buffer layer from the introduction of donor trap levels near the conduction band. In addition to identifying high field regions associated with device failure, the hyperspectral filter enables spectrum extraction, identifying peaks in the 700 nm-900 nm region associated with both defects and hot electrons that are contributing to device failure, but no change in signature after irradiation implying that radiation-induced defects are non-radiative. Complementary photoluminescence spectroscopy identified a reduction in free carrier density consistent with the generation of compensating trap levels, supporting the proposed model. (C) 2016 The Electrochemical Society. All rights reserved.
机译:基于氮化镓的高电子迁移率晶体管(HEMT)代表了RF放大器的关键下一代技术。在这项工作中,我们实现了电致发光(EL)成像,以研究高电压应力条件下制造和质子辐照设备中的击穿机理。辐照后,观察到击穿电压增加,缓冲液泄漏减少,这归因于由于在导带附近引入施主陷阱能级而导致的缓冲层中载流子类型转换,形成了背势垒结构。除了识别与设备故障相关的高场区域之外,高光谱滤镜还可以进行光谱提取,识别与导致设备故障的缺陷和热电子相关的700 nm-900 nm区域中的峰,但辐照后的特征无变化暗示辐射引起的缺陷是非辐射的。互补光致发光光谱法确定了与补偿陷阱能级的产生一致的自由载流子密度的降低,支持了所提出的模型。 (C)2016年电化学学会。版权所有。

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