首页> 外文期刊>ECS Journal of Solid State Science and Technology >Hydrogen-Free Deposition of Nanocrystalline Diamond by Channel-Spark Electron Beam Ablation
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Hydrogen-Free Deposition of Nanocrystalline Diamond by Channel-Spark Electron Beam Ablation

机译:沟道-火花电子束烧蚀纳米晶体金刚石的无氢沉积

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摘要

We report on the preparation of hydrogen-free nanocrystalline diamond films by pulsed electron beam ablation (channel-spark) from a single target on silicon and stainless steel substrates and under different process conditions. The films have been grown from highly ordered pyrolytic graphite at room temperature in an argon atmosphere under a pressure of 0.6 Pa. This study aims at elucidating the influence of the accelerating voltage (13, 14.5, and 16 kV) and electron beam pulse repetition rate (5 and 8 Hz) on film morphology, grain size, carbon-carbon sp3 content, and crystalline fraction. The films have been characterized using visible-reflectance spectroscopy, visible-Raman spectroscopy, scanning electron microscopy (SEM), and atomic force microscopy . (AFM). The correlations between measurement data and film properties are examined and discussed.
机译:我们报道了通过脉冲电子束烧蚀(通道火花)从硅和不锈钢基板上的单个靶材并在不同工艺条件下制备无氢纳米晶金刚石薄膜的方法。该薄膜是在室温下于0.6 Pa的氩气气氛下由高度有序的热解石墨制成的。本研究旨在阐明加速电压(13、14.5和16 kV)和电子束脉冲重复频率的影响(5和8 Hz)的薄膜形态,晶粒尺寸,碳碳sp3含量和结晶分数。使用可见反射光谱,可见拉曼光谱,扫描电子显微镜(SEM)和原子力显微镜对膜进行了表征。 (AFM)。检查和讨论了测量数据与薄膜性能之间的相关性。

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