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Transparent and Flexible Thin Film Transistors with Solution-Based Chalcogenide Materials

机译:透明和柔性薄膜晶体管,采用基于溶液的硫族化物材料

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摘要

The fabrication and characterization of optically transparent high performance photolithography-based cadmium sulfide (CdS) thin film transistors (TFT) on polymeric and glass substrates using chemical bath deposition (CBD) is reported. The process utilizes a maximum processing temperature of 115℃, which is compatible with most flexible substrates. The extracted mobility for the fabricated CdS-TFTs ranged from ~10-18 cm~2/V-s with a threshold voltage of ~1.6-4.8 V and I_(on)/I_(off) ratio of ~10~7. This carrier mobility is among the highest reported for a fully patterned TFT fabricated with CdS as semiconductor and the first transparent CdS-TFTs built on a flexible substrate with good optical transparency and excellent mechanical flexibility.
机译:报道了使用化学浴沉积(CBD)在聚合物和玻璃基板上光学透明的基于高性能光刻的硫化镉(CdS)薄膜晶体管(TFT)的制造和表征。该工艺使用的最高加工温度为115℃,可与大多数柔性基板兼容。制备的CdS-TFT的迁移率范围为〜10-18 cm〜2 / V-s,阈值电压为〜1.6-4.8 V,I_(on)/ I_(off)之比为〜10〜7。对于以CdS作为半导体制造的全图案TFT和在具有良好的光学透明性和出色的机械柔韧性的柔性基板上构建的第一批透明CdS-TFT,该载流子迁移率是最高的。

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