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Spectroscopic and electrochemical characterization of the interaction of nitrogen monoxide and cobalt tetrasulfonated phthalocyanine in aqueous solutions and surfactant films

机译:水溶液和表面活性剂膜中一氧化氮与四磺化钴酞菁钴相互作用的光谱和电化学表征

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Cobalt(II) tetrasulfonated phthalocyanine (Co(II)TSPc) was attached to didodecyldimethylammonium (DDA) and dodecyltrimethylammonium (DTA) films. Spectroscopic data suggest that monomeric Co(II)TSPc is the major species in the surfactant films. Differential pulse voltammetry for CoTSPc/DTA films in phosphate buffer solution at pH. 6 shows reduction peaks at + 0.61, + 0.06 and - 0.64 V attributed to Co(III)/Co(II), Co(II)/Co(I) and TSPc reduction, respectively. In CoTSPc/DDA films, Co(II) is reduced at - 0.03 V and TSPc at - 0,68 and - 0.84 V, and the peak for Co(III)/Co(II) is undetectable. The reaction of Co(II)TSPc with NO was studied for dissolved CoTSPc as well as for CoTSPc/DDA and CoTSPc/DTA films using spectroscopic and electrochemical techniques. From cyclic voltammetric data for Co(II)TSPc/DDA films in NO containing solution at pH 9, the stability constant of the Co(II)TSPc(NO) adduct was estimated to be 1.3 x 10(8) M-1. A slow shift of the FTIR band located at 1646-1700 cm(-1) for solid Co(II)TSPc/DDA films exposed to NO is attributed to a conformation from a bent to linear configuration for the CoTSPc(NO) adduct. The rate of this transformation as obtained from UV-Vis experiments conducted for CoTSPc dissolved in aqueous solution as well as from FTIR and electrochemical data for CoTSPc/DDA films is 0.015 +/- 0.002 min(-1). The Co(II)TsPc(NO) adduct formed in these films in solutions at pH 9 at NO concentrations (7 x 10- 5 M is reduced at - 0.17 V. Higher NO concentrations cause reductive nitrosylation and the formation of a Co(I)TSPc(NO+) complex which is reduced at - 0.72 and - 0.46 V, in DDA and DTA films, respectively. The electroreduction of NO at these potentials is positively shifted by 100 and 450 mV relatively to that obtained for DDA and DTA films devoid of CoTSPc, respectively. (C) 2000 Elsevier Science S.A. All rights reserved. [References: 53]
机译:四磺化酞菁钴(II)(Co(II)TSPc)连接到十二烷基二甲基铵(DDA)和十二烷基三甲基铵(DTA)膜上。光谱数据表明,单体Co(II)TSPc是表面活性剂膜中的主要物质。 pH下磷酸盐缓冲液中CoTSPc / DTA膜的微分脉冲伏安法。图6示出了分别归因于Co(III)/ Co(II),Co(II)/ Co(I)和TSPc还原的在+ 0.61,+ 0.06和-0.64V处的还原峰。在CoTSPc / DDA膜中,Co(II)在-0.03 V时还原,TSPc在-0.68和-0.84 V时还原,并且Co(III)/ Co(II)的峰不可检测。使用光谱学和电化学技术研究了Co(II)TSPc与NO的溶解CoTSPc以及CoTSPc / DDA和CoTSPc / DTA薄膜的反应。根据pH值为9的含NO溶液中Co(II)TSPc / DDA膜的循环伏安数据,Co(II)TSPc(NO)加合物的稳定常数估计为1.3 x 10(8)M-1。对于暴露于NO的固态Co(II)TSPc / DDA薄膜,位于1646-1700 cm(-1)的FTIR谱带的缓慢移动归因于CoTSPc(NO)加合物从弯曲构型到线性构型的构象。从对溶解在水溶液中的CoTSPc进行的UV-Vis实验以及从FTIR和CoTSPc / DDA膜的电化学数据获得的这种转变速率为0.015 +/- 0.002 min(-1)。这些膜在pH值为9的溶液中在NO浓度下形成的Co(II)TsPc(NO)加合物(在-0.17 V时还原了7 x 10-5M。NO浓度较高时会引起还原性亚硝化作用并形成Co(I )TSPc(NO +)络合物在DDA和DTA膜中分别在-0.72和-0.46 V时还原,在这些电势下NO的电还原相对于没有DDA和DTA膜的NO分别正向偏移100和450 mV (C)2000 Elsevier Science SA保留所有权利[引用:53]

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