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Epitaxial Growth of Ag_2S Film on Cleaved Surface of MgO(001)

机译:MgO(001)切割表面上Ag_2S薄膜的外延生长

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Epitaxial films of monoclinic Ag2S with various thicknesses were prepared on cleaved surfaces of MgO(001) by molecular beam epitaxy. The epitaxial relations of the films to the substra-tes were determined by X-ray diffractometry. For thin films, there are three kinds of crystallites with (012), (—112), and (040) parallel to (0Ol)Mgo· These are all equivalent in the high-temper-ature cubic form of Ag2S, corresponding to {110}. With respect to epitaxy within the substrate surface for the crystallites, the diagonal direction of the body-centered pseudocubic sulfur ar-rays of Ag2S, [100] and [201], are parallel to [100]Mgo, which is due to the coincidence of lattice dimensions of the film and substrate. For thick films, the epitaxial relations are (—1 12)”(001)Mgo and [421]//[010]Mgo, or (012)’/(OOl)Mgo and [4, —2, 1]”[OlO]MgO. The epitaxy for thick films is restricted not only by the surface periodicity of the substrate but also by the existence of steps generated during cleaving. The textures of thick films observed by polarized microscopy confirm that the epitaxial growth of the thick films is restricted by the steps.
机译:通过分子束外延在MgO(001)的劈裂面上制备了具有不同厚度的单斜Ag2S外延膜。薄膜与基体的外延关系通过X射线衍射法确定。对于薄膜,存在三种晶粒,它们的(012),(-112)和(040)平行于(0101)Mgo·。它们在Ag2S的高温立方形式中都是等效的,对应于{ 110}。关于微晶衬底表面内的外延,Ag2S的体心假立方硫氩射线的对角线方向[100]和[201]平行于[100] Mgo,这是由于重合薄膜和基材的晶格尺寸。对于厚膜,外延关系为(-1 12)”(001)Mgo和[421] // [010] Mgo,或(012)'/(001l)Mgo和[4,-2,1]” [ [OlO] MgO。厚膜的外延不仅受衬底表面周期性的限制,而且还受切割过程中产生的台阶的存在的限制。通过偏振显微镜观察到的厚膜的织构证实,厚膜的外延生长受到台阶的限制。

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