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Effect of spin polarization for hydrogen adsorbed on Si(111)(1x1) surface: First-principles calculations

机译:自旋极化对吸附在Si(111)(1x1)表面上的氢的影响:第一性原理计算

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The role of spin polarization on adsorption of atomic and molecular hydrogen on Si(111)(1 x 1) surface is examined by comparing the results of the local spin density approximation (LSD) and those of the local density approximation (LDA). A large improvement of the adsorption energies (around 0.8 eV/H) was found for the H atom adsorbed on Si(111)(1 x 1) surface. The inclusion of spin polarization reduces the overbinding between the H atom and the silicon surface and its effect is much more pronounced when the H atom is far away from the surface. Despite of the large changes in the adsorption energies, the main character of the potential energy surface of the H atom on Si(111)(1 x 1) surface is retained. An opposite effect is found in the charge-density-transfer map of LSD results as compared to LDA results for the H atom approaching the surface through the H3 path, in which the H atom loses electrons rather than gains electrons from the surface. The fact that the H atom tends to lose electrons in the silicon bulk has already been reported by the experimental studies for the behavior of the H atom in the p-type silicon. For the molecular hydrogen on Si(111)(1 x 1) surface, the effect of the spin polarization is so small that it can be neglected. (C) 2000 John Wiley & Sons, Inc. [References: 15]
机译:通过比较局部自旋密度近似(LSD)和局部密度近似(LDA)的结果,研究了自旋极化对Si(111)(1 x 1)表面原子和分子氢的吸附作用。发现吸附在Si(111)(1 x 1)表面的H原子的吸附能大大提高(约0.8 eV / H)。自旋极化的包含减少了H原子与硅表面之间的过度键合,并且当H原子远离表面时其效果更加明显。尽管吸附能发生了很大的变化,但仍保留了Si(111)(1 x 1)表面上H原子的势能表面的主要特征。与通过H3路径接近表面的H原子的LDA结果相比,在LSD结果的电荷密度转移图中发现了相反的效果,其中H原子失去电子而不是从表面获得电子。关于p型硅中的H原子的行为的实验研究已经报道了H原子趋向于在硅块中失去电子的事实。对于Si(111)(1 x 1)表面的分子氢,自旋极化的影响很小,可以忽略不计。 (C)2000 John Wiley&Sons,Inc. [参考:15]

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