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Electronic properties of copper-3d transition-metal pairs in silicon

机译:硅中的3d铜过渡金属对的电子性质

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摘要

We report a theoretical investigation of the chemical trends in the electronic properties of the substitutional Cu-interstitial 3d-transition-metal (Cr, Mn, Fe) trigonal pairs in silicon. The calculations were carried out in the framework of the multiple-scattering X#alpha# molecular cluster model. The electronic structures show that the stability of these pairs is mostly the result of a covalent interaction between the molecular orbitals coming not only from the Cu and TM atoms but also from the neighboring Si atoms. These results are in contrast to an ionic model which has been generally invoked to explain the stability of those pairs, but in agreement with some recent experimental findings. The Fermi contact terms for all the stable pairs in different charge states were computed and compared to available experimental data. We speculate on the existence of a different microscopic structure to explain these Cu-related complex pairs.
机译:我们报告了对硅中的替代性铜-间隙3d-过渡金属(Cr,Mn,Fe)三角对电子性质的化学趋势的理论研究。计算是在多散射X#alpha#分子簇模型的框架内进行的。电子结构表明,这些对的稳定性主要是不仅来自Cu和TM原子而且来自相邻Si原子的分子轨道之间的共价相互作用的结果。这些结果与离子模型相反,该离子模型通常被用来解释那些离子对的稳定性,但与最近的一些实验结果相符。计算了处于不同电荷状态的所有稳定对的费米接触项,并将其与可用的实验数据进行比较。我们推测存在不同的微观结构来解释这些与铜有关的复合物对。

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