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首页> 外文期刊>International journal of mass spectrometry >Surface-assisted laser desorption/ionization mass spectrometry on nanostructured silicon substrates prepared by iodine-assisted etching
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Surface-assisted laser desorption/ionization mass spectrometry on nanostructured silicon substrates prepared by iodine-assisted etching

机译:碘辅助刻蚀制备的纳米硅衬底上的表面辅助激光解吸/电离质谱

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Surface-assisted laser desorption/ionization (SALDI) is a matrix-free mass spectrometry (MS) approach that utilizes the unique properties of a nanostructured surface to promote desorption and ionization. However, there are still questions on what constitutes a suitable SALDI substrate for mass spectrometric application. A range of SALDI substrates prepared by anodization with an oxidizing electrolyte was investigated. The laser desorption/ionization (LDI) performance was examined on a reflectron time-of-flight (ToF) mass spectrometer. The physicochemical properties of the substrates were characterized by a number of surface analysis techniques including scanning electron microscopy (SEM), atomic force microscopy (AFM), secondary ion mass spectrometry (SIMS). X-ray photoelectron spectroscopy (XPS) and water contact angle measurement. Examination of surface cleaning technologies and methods for surface chemical modification were carried out. Correlation between the substrate physicochemical properties and the LDI performance was determined. It was found that only the substrate, which had a thick nanostructured layer, was effective for LDI-MS. SALDI substrate was found to have a high surface potential. However, this unique property offered no advantage for the application of LDI-MS. Surface chemistry is also an important factor in affecting the LDI performance. Plasma etching can effectively remove the surface contamination but it also increases the thickness of the oxide layer. Fluorine and hydroxyl termination is advantageous. Fluorine passivation increases the surface hydrophobicity, which confines the analyte solution droplet to a smaller area and also withdraws the electronic density from the surface, and acidifies the surface Si-OH moieties. which is believed a major proton source. The effect of laser etching was investigated by SIMS and XPS imaging and provided new insight of the SALDI ionization mechanism.
机译:表面辅助激光解吸/电离(SALDI)是一种无矩阵质谱(MS)方法,它利用纳米结构表面的独特特性来促进解吸和电离。但是,对于由什么构成适合质谱应用的SALDI底物,仍然存在疑问。研究了通过用氧化电解质进行阳极氧化制备的一系列SALDI基板。在反射式飞行时间(ToF)质谱仪上检查了激光解吸/电离(LDI)性能。通过许多表面分析技术,包括扫描电子显微镜(SEM),原子力显微镜(AFM),二次离子质谱(SIMS),对基材的物理化学性质进行了表征。 X射线光电子能谱(XPS)和水接触角测量。进行了表面清洁技术和表面化学改性方法的检查。确定了底物理化性质与LDI性能之间的相关性。发现只有具有厚纳米结构层的基底对LDI-MS有效。发现SALDI衬底具有高表面电势。但是,这种独特的特性对于LDI-MS的应用没有任何优势。表面化学也是影响LDI性能的重要因素。等离子蚀刻可以有效地去除表面污染,但同时也会增加氧化层的厚度。氟和羟基封端是有利的。氟钝化增加了表面疏水性,这将分析物溶液的液滴限制在较小的区域,并且还从表面吸收了电子密度,并酸化了表面的Si-OH部分。被认为是质子的主要来源。通过SIMS和XPS成像研究了激光蚀刻的效果,并为SALDI电离机理提供了新的见识。

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