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首页> 外文期刊>International Journal of Nanotechnology >E-beam lithography processing of Au-nanowire contacts for development of gas sensors based on tungsten-oxide nanorods self-assembled on mica
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E-beam lithography processing of Au-nanowire contacts for development of gas sensors based on tungsten-oxide nanorods self-assembled on mica

机译:基于自组装在云母上的氧化钨纳米棒的金纳米线触点的电子束光刻工艺开发

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This work describes the processing of Au nanowire arrays on insulating substrate developed to contact tungsten-oxide nanorods self-organised on the mica surface. The combination of electron beam lithography in scanning electron microscope and lift-off process is shown to be effective in fabricating nanocontact finger patterns with a line width of about 270 nm and 400 nm on bare and WO_3 nanorod covered mica surfaces, respectively, separated by a few micrometre distance. It is shown that at right selection of the distance between Au nanowires, the applied procedure makes possible to contact WO_3 nanorods of different length and density even if the nanostructures do not form an interconnected net. It opens the way for fabrication of single-wire nanosensors grown on insulating substrates.
机译:这项工作描述了在绝缘基板上开发的Au纳米线阵列的工艺,该阵列被开发为接触在云母表面自组织的氧化钨纳米棒。扫描电子显微镜中的电子束光刻技术和剥离工艺的结合被证明可有效地在裸露的WO_3纳米棒覆盖的云母表面上制造线宽分别约为270 nm和400 nm的纳米接触指状图案,并用纳米线隔开几微米的距离。结果表明,在正确选择金纳米线之间的距离的情况下,即使纳米结构没有形成相互连接的网,所应用的程序也可以接触不同长度和密度的WO_3纳米棒。它为在绝缘基板上生长的单线纳米传感器的制造开辟了道路。

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