AFM and light scattering measurements of optical thin films for applications in the UV spectral region

摘要

Combination of atomic force microscopy and scattering measurements allows controlling themicrostructure of substrates and optical thin films in the nanometer scale and of surface homogeneityover large areas. Results are presented of measurements on superpolished and conventionallypolished substrates as well as on thin film fluoride coatings, demonstrating the capabilities of thesemeasurement techniques.