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Highly Reflective Thin Film Coatings for High Power Applications of Micro Scanning Mirrors in the NIR-VIS-UV Spectral Region

机译:高压薄膜涂层,用于高扫描镜中的高功率应用在NIR-VIR-UV光谱区域中

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This paper addresses different highly reflective optical coatings on micro scanning mirrors (MSM) for applications in the NIR-VIS-UV-spectral region to enable new applications at high optical power density like laser marking and material treatment. In the common case of MSM with an unprotected Al coating, the absorption limits the maximal power density because of induced heating. In contrast to macroscopic optics HR-micro mirror coatings have to guarantee additional demands like low-stress and CMOS compatibility. Hence, to enable novel high power applications of MSM in the NIR-VIS-UV spectral region highly reflective low-stress coatings have been developed according to a triple strategy: (a) broadband metallic reflectors, (b) dielectric multilayers and (c) enhanced hybrid coatings. For Au and Ag based NIR-coatings an excellent mirror planarity and a reflectance around 99 % (@ 1064 nm) have been achieved, whereas dielectric coatings reached 99.7 % for a (LH)~4 design and thinner low-stress hybrid NIR-coatings reached up to 99.8 % enabling an improved mirror planarity and excellent laser damage threshold. For the VIS and UV spectral region enhanced hybrid HR-coatings have been favored, because they enable high reflectance of up to 99.7 % @ 633 nm or 98.8 % @ 308 nm in combination with low stress, high mirror planarity and CMOS compatibility.
机译:本文在微扫描镜(MSM)上寻址用于NIR-VIS-UV光谱区域中的应用的不同高度反射光学涂层,以实现在激光标记和材料处理等高光功率密度下的新应用。在具有未受保护的Al涂层的MSM的常见情况下,由于诱导的加热,吸收限制了最大功率密度。与宏观光学性HR-Micro镜涂层相比,必须保证额外要求的低应力和CMOS兼容性。因此,为了使MSM的新型高功率应用在NIR-VIS-UV光谱区域中,根据三重策略开发了高反射低应力涂层:(a)宽带金属反射器,(b)介电多层和(c)增强的混合涂层。对于AU和基于AG的NIR涂层,已经实现了优异的镜面平面和约99%(@ 1064nm)的反射率,而介电涂层对于(LH)〜4设计和较薄的低应力杂交NIR涂层达到99.7%达到99.8%,使镜面平面和优异的激光损伤阈值能够实现改进。对于VIS和UV光谱区域增强的杂交HR涂层已经受到青睐,因为它们能够高达99.7%的高达99.7%或98.8%@ 308nm的高度反射率,以及低应力,高镜面平面和CMOS兼容性。

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