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Design considerations of scanning optical microscope (SOM) for specific applications of thin films and semiconductor characterization.

机译：扫描光学显微镜（SOM）的设计考虑因素，用于薄膜的特定应用和半导体表征。

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作者
Baruah, Kishor Kumar.;
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作者单位

Gauhati University (India).;

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授予单位 Gauhati University (India).;
学科 Optics.
学位 Ph.D.
年度 1999
页码 121 p.
总页数 121
原文格式 PDF
正文语种 eng
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3. Application of in situ ellipsometry in the fabrication of thin-film optical coatings on semiconductors [J] . Marcel G. Boudreau, Steven G. Wallace, Ginutis Balcaitis Applied optics . 2000,第6期

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5. Design, development, and applications of image scanning ellipsometry for the measurement of thin film thickness profiles. [D] . Liu, An-Hong. 1994

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6. Imaging optical fields below metal films and metal-dielectric waveguides by a scanning microscope [O] . Liangfu Zhu, Yong Wang, Douguo Zhang, -1

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8. Some Optical and Electron Microscope Comparative Studies of Excimer Laser-assisted and Nonassisted Molecular-Beam Epitaxically Grown Thin GaAs Films [R] . Lao, P., Tang, W. C., Rajkumar, K. C., 1990

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Design considerations of scanning optical microscope (SOM) for specific applications of thin films and semiconductor characterization.

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