首页> 外文期刊>International Heat Treatment and Surface Engineering >Differences in nitrided layer between classic active screen plasma nitriding and active screen plasma nitriding with hemispherical cathodic cage
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Differences in nitrided layer between classic active screen plasma nitriding and active screen plasma nitriding with hemispherical cathodic cage

机译:经典活性屏等离子体氮化与半球形阴极笼活性屏等离子体氮化之间的氮化层差异

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Active screen plasma nitriding (ASPN) is commonly used when regular surface hardening is necessary. The ASPN technique produces a more homogeneous surface coating than direct current plasma nitriding (DCPN) due to different process principles. The term active screen in plasma nitriding refers to a cathodic cage with a defined geometry. The purpose of this work was to study the differences between ASPN using a hemispherical cathodic cage and ASPN using a normal cylindrical cathodic cage. Following some trials using similar parameters, the tests were carried out with three conditions: with DCPN, with a cylindrical cathodic cage in ASPN and with a hemispherical cathodic cage in ASPN. X-ray diffraction and scanning electron microscopy analysis together with energy dispersive spectroscopy were applied to characterise the nitrided layers. The nitrided layers are not the same for each of the conditions used. The ASPN with a hemispherical cathodic cage produced a layer of almost Fe_3N alone, while the other processes gave significant amounts of Fe_4N in the nitrided layer. Scanning electron microscopy analysis showed different surface morphology for each condition.
机译:当需要定期进行表面硬化时,通常使用有源丝网等离子体氮化(ASPN)。由于工艺原理不同,ASPN技术产生的涂层比直流等离子体氮化(DCPN)更为均匀。等离子体氮化中的有源屏蔽是指具有规定几何形状的阴极笼。这项工作的目的是研究使用半球形阴极保持架的ASPN和使用常规圆柱阴极保持架的ASPN之间的差异。在使用类似参数进行一些试验之后,在三个条件下进行了测试:使用DCPN,使用ASPN中的圆柱形阴极笼和使用ASPN中的半球形阴极笼。 X射线衍射和扫描电子显微镜分析与能量色散光谱一起用于表征氮化层。对于所使用的每种条件,氮化层都不相同。具有半球形阴极笼的ASPN仅产生几乎Fe_3N的层,而其他过程在氮化层中产生大量Fe_4N。扫描电子显微镜分析显示每种条件下不同的表面形态。

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