...
首页> 外文期刊>Intermetallics >Microstructure and thermoelectric properties of Sb doped Hf0.25Zr0.75NiSn Half-Heusler compounds with improved carrier mobility
【24h】

Microstructure and thermoelectric properties of Sb doped Hf0.25Zr0.75NiSn Half-Heusler compounds with improved carrier mobility

机译:载流子迁移率提高的Sb掺杂Hf0.25Zr0.75NiSn Half-Heusler化合物的微观结构和热电性能

获取原文
获取原文并翻译 | 示例
           

摘要

Half-Heusler (HH) semiconductor alloys are being widely investigated due to their promising potential for thermoelectric (TE) power generation applications. Sb is an effective doping element for n-type ZrNiSn half-Heuslers alloys. HH thermoelectric materials Hf0.25Zr0.75NiSn1-xSbx (0 <= x <= 0.03) were synthesized by induction melting combined with plasma activated sintering (PAS) technique. X-ray diffraction concluded that single-phase HH compounds without compositional segregations were obtained. Presence of bended lamellar structures was revealed by the FESEM. Sb doping significantly enhanced the electrical conductivity, power factor and carrier concentration of the alloys. An increase in the carrier mobility was also observed. Consequently, optimum values of 4.36 x 10(-3) W/mk(2) and 4.7 x 10(20) cm(-3) were achieved for power factor and carrier concentration, respectively. As a result, a ZT value of 0.83 at 923 K was obtained which is about 67% improvement compared to the un-doped sample. (C) 2016 Elsevier Ltd. All rights reserved.
机译:由于半霍斯勒(HH)半导体合金在热电(TE)发电应用中具有广阔的发展潜力,因此正在被广泛研究。 Sb是n型ZrNiSn半霍斯勒合金的有效掺杂元素。 HH热电材料Hf0.25Zr0.75NiSn1-xSbx(0 <= x <= 0.03)是通过感应熔化结合等离子活化烧结(PAS)技术合成的。 X射线衍射得出的结论是,获得了没有成分偏析的单相HH化合物。 FESEM揭示了弯曲的层状结构的存在。锑的掺杂显着提高了合金的电导率,功率因数和载流子浓度。还观察到载流子迁移率增加。因此,对于功率因数和载流子浓度,分别获得了4.36 x 10(-3)W / mk(2)和4.7 x 10(20)cm(-3)的最佳值。结果,在923K下获得0.83的ZT值,与未掺杂样品相比,ZT值提高了约67%。 (C)2016 Elsevier Ltd.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号