A high-current impulse implanter on the basis of a high-current ion diode with a radial magnetic field and preliminary plasma production is described. Plasma is formed at the diode anode using a negative voltage pulse that precedes an accelerating-voltage pulse. The pause between pulses is 500 +/- 50 ns. Graphite is used as the emission coating on the anode. An ion beam with a current density in the diode focal plane of up to 80 A/cm(2) was obtained. Analysis of the elemental composition of the ion beam using the time-of-flight technique showed that the ion beam consists mainly of D+ and D+2 carbon ions and De(+) protons.
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