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A Source of Broad Electron Beams with a Self-Heated Hollow Cathode for Plasma Nitriding of Stainless Steel

机译:具有自热空心阴极的宽电子束源,用于不锈钢的等离子渗氮

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摘要

The principle of operation and characteristics of a broad electron beam source based on the discharge with a self-heated hollow cathode and widened anode part are described. The source is intended for the ion nitriding of metals in the electron beam plasma. The influence of the current density (1 - 7 mA/cm~2) and ion energy (0.1 - 0.3 keV) on the nitriding rate of the 12X18H10T austenitic stainless steel is studied. It is shown that the maximal nitriding rate is reached by the combining of the minimal bias voltage across the samples (100 V) and maximal ion current density, which ensures the dynamic oxide layer sputtering on the sample surface. The electron source, in which electrons are extracted through a stabilizing grid in the direction normal to the axis of the hollow cathode, ensures the radially divergent electron beam formation with a 700-cm~2 initial cross section, a current of up to 30 A, and initial electron energy of 0.1 - 0.5 keV. The source stably operates at nitrogen - argon mixture pressures of up to 3 Pa.
机译:描述了基于带有自加热空心阴极和加宽阳极部分的放电的宽电子束源的工作原理和特性。该源用于电子束等离子体中金属的离子氮化。研究了电流密度(1-7 mA / cm〜2)和离子能量(0.1-0.3 keV)对12X18H10T奥氏体不锈钢渗氮速率的影响。结果表明,通过将样品两端的最小偏置电压(100 V)和最大离子电流密度相结合,可以达到最大氮化速率,从而确保了动态氧化层溅射在样品表面上。电子源中的电子通过一个稳定的栅格沿垂直于中空阴极轴的方向通过稳定栅抽出,从而确保形成径向截面的电子束,初始截面为700-cm〜2,电流高达30 A ,初始电子能量为0.1-0.5 keV。源在高达3 Pa的氮气-氩气混合压力下稳定运行。

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