A Plasmatron with Interelectrode Inserts for Depositing Diamond and Diamond-like Films

摘要

A plasmatron with a sectionalized interelectrode insert, intended for heating argon up to a temperature of 10 000 to 11 000 K, is described. Investigations have shown that the volt-ampere characteristics of an arc in an argon flow are ascending in the operating range of the plasmatron parameters. The thermal efficiency is as high as 0.9. The plasmatron is used in the chemical gas-phase deposition of thin wear-resistant diamond-like films with the application of a high-temperature supersonic plasma jet.