首页> 外文期刊>Integrated Ferroelectrics >Structural and Electrical Properties of Bi_(3.25)La_(0.75)Ti_3O_(12) and Bi_(3.25)Pr_(0.75)Ti_3O_(12) Thin Films for Memory Applications
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Structural and Electrical Properties of Bi_(3.25)La_(0.75)Ti_3O_(12) and Bi_(3.25)Pr_(0.75)Ti_3O_(12) Thin Films for Memory Applications

机译:用于存储器的Bi_(3.25)La_(0.75)Ti_3O_(12)和Bi_(3.25)Pr_(0.75)Ti_3O_(12)薄膜的结构和电学性质

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In this work, Bi_(3.25)La_(0.75)Ti_3O_12 (BLT) and Bi_(3.25) Pr_(0.75)Ti_3O_12 (BPT) thin films were prepared by chemical solution deposition and characterized by X-ray diffraction, scanning electron microscope and electrical measurements. Layered perovskite BLT and BPT films ran be achieved by 180 s annealing at a temperature as low as 650 deg C. Both BPT and BLT films are composed of closely packed spherical grains. BPT shows larger tenant polarization (Pr) and smaller coercive field. The Pr values of 700 deg C annealed BLT and BPT films are 18.3 muC/cm~2 and 20.5 muC/cm~2, respectively, while BLT films show better-saturated hysteresis loops. The leakage current density of BPT films is significantly (about one order) lower than that of BLT. The dielectric properties of BLT and BPT films were measured and compared. Both films exhibit large dielectric constant and small loss tangent. Under bipolar switching cycles, BLT films showed little polarization reduction but a 30 percent polarization loss was observed for BPT films after 2 X 10~9 cycles.
机译:在这项工作中,Bi_(3.25)La_(0.75)Ti_3O_12(BLT)和Bi_(3.25)Pr_(0.75)Ti_3O_12(BPT)薄膜通过化学溶液沉积法制备,并通过X射线衍射,扫描电子显微镜和电学表征测量。钙钛矿层状BLT和BPT薄膜可在低至650摄氏度的温度下通过180 s退火来实现。BPT和BLT薄膜均由紧密堆积的球形晶粒组成。 BPT显示较大的租户极化(Pr)和较小的矫顽场。 700℃退火的BLT和BPT薄膜的Pr值分别为18.3μC/ cm〜2和20.5μC/ cm〜2,而BLT膜表现出更好的饱和磁滞回线。 BPT膜的漏电流密度明显低于BLT(大约一个数量级)。测量并比较了BLT和BPT薄膜的介电性能。两种膜均表现出大的介电常数和小的损耗角正切。在双极转换周期下,BLT膜几乎没有偏振降低,但在2 X 10〜9个周期后,BPT膜观察到30%的偏振损耗。

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