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首页> 外文期刊>Integrated Ferroelectrics >ELECTRICAL PROPERTIES OF PGO-DOPED PNN-PZT THICK FILMS ON SI PREPARED BY SCREEN PRINTING METHOD
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ELECTRICAL PROPERTIES OF PGO-DOPED PNN-PZT THICK FILMS ON SI PREPARED BY SCREEN PRINTING METHOD

机译:丝网印刷法制备的掺PGO的PNN-PZT厚膜的电学性能

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摘要

PNN-PZT piezoelectric thick films were prepared on Pt/YSZ/SiO_2/Si substrates by a screen printing method. 0 approx 3 wt percent Pb_5Ge_3O_(11)(PGO) or 1 wt percent PbO was added to prepare dense PNN-PZT thick films at low firing temperature. Densification, microstructure and electrical properties were investigated in the Pb_5G_e3O_(11) or PbO-doped PNN-PZT thick films which were fired at 900 deg C. Pb_5Ge_3O_(11) doping increased the average grain size and the density, and enhanced electrical'properties of the PNN-PZT thick film. However, the electrical properties of the PNN-PNT thick film were not improved by PbO doping due to chemical reaction and inter-diffusion at the interface between the thick film and the bottom electrode. The 2 wt percent Pb_5Ge_3O_(11)-doped PNN-PZT thick film had the densest microstructure and the best electrical properties; dielectric constant (epsilon_r) of 1431, remanent polarization (P_r) of 21.0 /iC/cm~2 and coercive electric field (E_c) of 22.7 kV/cm.
机译:采用丝网印刷法在Pt / YSZ / SiO_2 / Si衬底上制备了PNN-PZT压电厚膜。添加0重量%的Pb_5Ge_3O_(11)(PGO)或1重量%的PbO,以在低烧成温度下制备致密的PNN-PZT厚膜。研究了在900摄氏度下焙烧的Pb_5G_e3O_(11)或PbO掺杂的PNN-PZT厚膜的致密化,微观结构和电学性能。Pb_5Ge_3O_(11)掺杂增加了平均晶粒尺寸和密度,并增强了电性能的PNN-PZT厚膜。然而,由于在厚膜和底部电极之间的界面处的化学反应和相互扩散,PbO掺杂不能改善PNN-PNT厚膜的电性能。掺杂2%(重量)的Pb_5Ge_3O_(11)的PNN-PZT厚膜具有最致密的微观结构和最佳的电性能。介电常数(epsilon_r)为1431,剩余极化强度(P_r)为21.0 / iC / cm〜2,矫顽电场(E_c)为22.7 kV / cm。

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