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Microstructere and Dielectric Properties-of Nd-doped Bismuth Titanate

机译:掺钕钛酸铋的微结构和介电性能

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摘要

Bi_(3.15)Nd_(0.85)Ti_3O_(12) (BNdT) thin films were prepared on Pt(100)/Ti/SiO_2/Si(100) substrate by sol-gel process. Perovskite crystalline was observed in the thin films achieved, and the grain size of the thin film was about 200 nm in diameter with sharp and clear boundaries between different films and the Pt electrodes. Well-saturated polarization-voltage (P-V) switching curves were examined in the BNdT thin films. The remnant polarization and the coercive field of the BNdT thin films annealed at 750 deg C were 43 mu C/cm~2 and 66 kv/cm at an applied voltage of 8v, respectively. The dielectric constant and the dissipation factor were 583 and 0.07 respectively, measured at 100 KHz.
机译:通过溶胶-凝胶法在Pt(100)/ Ti / SiO_2 / Si(100)衬底上制备了Bi_(3.15)Nd_(0.85)Ti_3O_(12)(BNdT)薄膜。在所获得的薄膜中观察到钙钛矿晶体,并且该薄膜的晶粒尺寸为直径约200nm,并且在不同的薄膜和Pt电极之间具有清晰的边界。在BNdT薄膜中检查了饱和饱和的极化电压(P-V)切换曲线。在750℃退火的BNdT薄膜的残余极化和矫顽场在8v施加电压下分别为43μC/ cm〜2和66kv / cm。在100 KHz下测得的介电常数和损耗因子分别为583和0.07。

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