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Dielectric and Tunable Properties of B_(0.96)Ca_(0.04)Ti_(0.84)Zr_(0.16)O_3 (BCTZ) on MgO and SiO_2/Si substrates

机译:MgO和SiO_2 / Si基体上B_(0.96)Ca_(0.04)Ti_(0.84)Zr_(0.16)O_3(BCTZ)的介电和可调性质

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摘要

Mg doped Ba_(0.96)Ca_(0.04)Ti(0.84)Zr_(0.16)O_3 (BCTZ) thin film was fabricated on Pt/MgO and Pt/Ti/SiO_2/Si substrates by spin-on metal-organic decomposition (MOD) method. The films were annealed in a furnace at temperatures in the range of 600-900 deg C for about an hour in flowing oxygen environment. X-ray diffraction (XRD) analysis shows the formation of perovskite phase with grain size less than 100 nanometer. Increasing in annealing temperature resulted in better crystallinity of the films. BCTZ films on Pt/MgO substrates show significantly higher dielectric constant and tenability over Pt/Ti/SiO_2/Si substrates without significant difference in dissipation factors. Post annealing the films in oxygen environment resulted in significant for these films.
机译:通过旋涂金属有机分解法在Pt / MgO和Pt / Ti / SiO_2 / Si衬底上制备了掺Mg的Ba_(0.96)Ca_(0.04)Ti(0.84)Zr_(0.16)O_3(BCTZ)薄膜。方法。在流动的氧气环境中,将膜在炉中在600-900℃范围内的温度下退火约1小时。 X射线衍射(XRD)分析表明形成了晶粒尺寸小于100纳米的钙钛矿相。退火温度的提高导致膜的结晶性更好。与Pt / Ti / SiO_2 / Si衬底相比,Pt / MgO衬底上的BCTZ薄膜显示出更高的介电常数和延展性,而耗散因数没有显着差异。在氧气环境中对膜进行后退火对这些膜而言具有重要意义。

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