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Enhanced thermoelectric properties of the Dirac semimetal Cd3As2

机译:Dirac半金属Cd3As2的增强的热电性能

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We report an investigation of temperature- and doping-dependent thermoelectric behavior of the topological semimetal Cd3As2. The electrical conductivity, thermal conductivity, Seebeck coefficient, and figure of merit (ZT) are calculated using the Boltzmann transport theory. The calculated thermoelectric properties of the pristine Cd3As2 match well with the experimental results. Electron or hole doping, especially the latter, is found to much improve the thermoelectric behavior of the material. The optimum figure of merit ZT of Cd3As2 with electron doping is found to be about 0.5 at T = 700 K with n = 1 × 10~(20) cm~(-3), which is much larger than the maximum experimental value obtained for pristine Cd3As2 (~0.15). For p-type Cd3As2, the maximal value of the Seebeck coefficient as a function of temperature increases apparently with the increase of the hole doping concentration and its position shifts drastically towards the lower temperature region, compared to that of n-type Cd3As2. This leads to an optimum figure of merit ZT of about 0.5, obtained at a low temperature of 500 K (p = 1 × 10~(20) cm~(-3)) in the p-type Cd3As2.
机译:我们报告了拓扑半金属Cd3As2的温度和掺杂依赖性热电行为的调查。电导率,热导率,塞贝克系数和品质因数(ZT)使用玻耳兹曼输运理论进行计算。原始Cd3As2的热电性能与实验结果吻合良好。发现电子或空穴掺杂,特别是后者,可以大大改善材料的热电性能。发现Cd3As2的电子掺杂的最佳品质因数ZT在T = 700 K且n = 1×10〜(20)cm〜(-3)时约为0.5,远大于获得的最大实验值。原始Cd3As2(〜0.15)。对于p型Cd3As2,与n型Cd3As2相比,塞贝克系数的最大值作为温度的函数随着空穴掺杂浓度的增加而明显增加,并且其位置急剧向较低温度区域移动。这导致在p型Cd3As2的500 K低温(p = 1×10〜(20)cm〜(-3))下获得的最佳品质因数ZT约为0.5。

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