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Photocapacitance study of GaSb: In, As for defect analysis in InAs/GaSb type-II strained layer superlattices

机译:GaSb的光电容研究:In,作为InAs / GaSb II型应变层超晶格中的缺陷分析

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摘要

Steady-state photocapacitance measurements were used to characterize GaSb incorporated with In, As, and a control sample. Evidence of a trap level at 0.55 eV was observed for all samples. The change in the capacitance for the sample with indium was about half the change for the other samples, indicating that the addition of indium modified the near-mid-gap trap levels. Another change in capacitance starting at 0.71 eV was attributed to electrons from the valence band filling levels close to the conduction band. (C) 2014 Elsevier B.V. All rights reserved.
机译:稳态光电容测量用于表征掺有In,As和对照样品的GaSb。对于所有样品,均观察到陷阱水平为0.55 eV的证据。含铟样品的电容变化约为其他样品变化的一半,表明铟的添加改变了近中能隙陷阱能级。电容的另一个变化始于0.71 eV,这归因于价带填充能级接近导带的电子。 (C)2014 Elsevier B.V.保留所有权利。

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