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Influence of the p-type doping on the radiometric performances of MWIR InAs/GaSb superlattice photodiodes

机译:p型掺杂对MWIR InAs / GaSb超晶格光电二极管辐射性能的影响

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摘要

In this paper, quantum efficiency (QE) measurements performed on type-II InAs/GaSb superlattice (T2SL) photodiodes operating in the mid-wavelength infrared domain, are reported. Several comparisons were made in order to determine the SL structure showing optimum radiometric performances: same InAsrich SL structure with different active zone thicknesses (from 0.5 mu m to 4 mu m) and different active zone doping (n-type versus p-type), same 1 mu m thick p-type active zone doping with different SL designs (InAs-rich versus GaSb-rich and symmetric SL structures). Best result was obtained for the p-type doped InAs-rich SL photodiode, with a 4 mu m active zone thickness, showing a QE that reaches 61% at lambda = 2 mu m and 0 V bias voltage. (C) 2014 Elsevier B.V. All rights reserved.
机译:在本文中,报告了在中波长红外域中运行的II型InAs / GaSb超晶格(T2SL)光电二极管上进行的量子效率(QE)测量。为了确定显示最佳辐射性能的SL结构,进行了几次比较:相同的InAsrich SL结构,具有不同的有源区厚度(从0.5μm到4μm)和不同的有源区掺杂(n型与p型),相同的1微米厚的p型有源区掺杂,具有不同的SL设计(富InAs与富GaSb的对称SL结构)。具有4μm有源区厚度的p型掺杂富InAs的SL光电二极管获得了最佳结果,显示出在λ= 2μm和0 V偏置电压时QE达到61%。 (C)2014 Elsevier B.V.保留所有权利。

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