首页> 外文期刊>Audiology & neuro-otology >Intracochlear Position of Cochlear Implants Determined Using CT Scanning versus Fitting Levels: Higher Threshold Levels at Basal Turn
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Intracochlear Position of Cochlear Implants Determined Using CT Scanning versus Fitting Levels: Higher Threshold Levels at Basal Turn

机译:使用CT扫描确定的人工耳蜗内位置与适合水平:基底转弯时的门槛水平较高

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Objectives: In this study, the effects of the intracochlear position of cochlear implants on the clinical fitting levels were analyzed. Design: A total of 130 adult subjects who used a CII/HiRes 90K cochlear implant with a HiFocus 1/1J electrode were included in the study. The insertion angle and the distance to the modiolus of each electrode contact were determined using high-resolution CT scanning. The threshold levels (T-levels) and maximum comfort levels (M-levels) at 1 year of follow-up were determined. The degree of speech perception of the subjects was evaluated during routine clinical follow-up. Results: The depths of insertion of all the electrode contacts were determined. The distance to the modiolus was significantly smaller at the basal and apical cochlear parts compared with that at the middle of the cochlea (p < 0.05). The T-levels increased toward the basal end of the cochlea (3.4 dB). Additionally, the M-levels, which were fitted in our clinic using a standard profile, also increased toward the basal end, although with a lower amplitude (1.3 dB). Accordingly, the dynamic range decreased toward the basal end (2.1 dB). No correlation was found between the distance to the modiolus and the T-level or the M-level. Furthermore, the correlation between the insertion depth and stimulation levels was not affected by the duration of deafness, age at implantation or the time since implantation. Additionally, the T-levels showed a significant correlation with the speech perception scores (p < 0.05). Conclusions: The stimulation levels of the cochlear implants were affected by the intracochlear position of the electrode contacts, which were determined using postoperative CT scanning. Interestingly, these levels depended on the insertion depth, whereas the distance to the modiolus did not affect the stimulation levels. The T-levels increased toward the basal end of the cochlea. The level profiles were independent of the overall stimulation levels and were not affected by the biographical data of the patients, such as the duration of deafness, age at implantation or time since implantation. Further research is required to elucidate how fitting using level profiles with an increase toward the basal end of the cochlea benefits speech perception. Future investigations may elucidate an explanation for the effects of the intracochlear electrode position on the stimulation levels and might facilitate future improvements in electrode design. (C) 2016 S. Karger AG, Basel
机译:目的:在这项研究中,分析了耳蜗植入物的耳蜗内位置对临床适应水平的影响。设计:总共130名使用CII / HiRes 90K耳蜗和HiFocus 1 / 1J电极的成年受试者被纳入研究。使用高分辨率CT扫描确定每个电极触点的插入角度和到陀螺的距离。确定了随访1年的阈值水平(T级)和最大舒适度(M级)。在常规临床随访期间评估受试者的言语感知程度。结果:确定所有电极触点的插入深度。与耳蜗中部的距离相比,在耳蜗的基部和顶端的距离远小于耳蜗的距离(p <0.05)。 T水平向耳蜗基端增加(3.4 dB)。此外,我们使用标准轮廓安装在我们诊所中的M电平也向基端增加,尽管幅度较低(1.3 dB)。因此,动态范围朝基端减小(2.1 dB)。到阴茎的距离与T水平或M水平之间未发现相关性。此外,耳聋的持续时间,植入时的年龄或植入后的时间不受插入深度与刺激水平之间的相关性影响。另外,T水平显示与语音感知得分显着相关(p <0.05)。结论:耳蜗植入物的刺激水平受电极接触的耳蜗内位置影响,这是通过术后CT扫描确定的。有趣的是,这些水平取决于插入深度,而到阴茎的距离不影响刺激水平。 T水平朝着耳蜗的基端增加。所述水平曲线与总体刺激水平无关,并且不受患者的传记数据的影响,例如耳聋的持续时间,植入时的年龄或植入后的时间。需要进一步的研究来阐明使用水平轮廓向耳蜗基端增加的拟合如何有益于语音感知。将来的研究可能会阐明对耳蜗内电极位置对刺激水平的影响的解释,并且可能有助于将来电极设计的改进。 (C)2016 S.Karger AG,巴塞尔

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