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The effect of spatial competition between object-level representations of target and mask on object substitution masking

机译:目标和蒙版的对象级表示之间的空间竞争对对象替换蒙版的影响

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摘要

One of the processes determining object substitution masking (OSM) is thought to be the spatial competition between independent object file representations of the target and mask (e. g., Kahan & Lichtman, 2006). In a series of experiments, we further examined how OSM is influenced by this spatial competition by manipulating the overlap between the surfaces created by the modal completion of the target (an outline square with a gap in one of its sides) and the mask (a four-dot mask). The results of these experiments demonstrate that increasing the spatial overlap between the surfaces of the target and mask increases OSM. Importantly, this effect is not caused by the mask interfering with the processing of the target features it overlaps. Overall, the data indicate, consistent with Kahan and Lichtman, that OSM can arise through competition between independent target and mask representations.
机译:确定对象替代掩蔽(OSM)的过程之一被认为是目标和掩蔽的独立目标文件表示之间的空间竞争(例如,Kahan&Lichtman,2006)。在一系列实验中,我们通过操纵目标的模态完成(在其侧面之一上有缝隙的轮廓正方形)和蒙版(一个四点蒙版)。这些实验的结果表明,增加目标和掩模表面之间的空间重叠会增加OSM。重要的是,这种影响不是由遮罩干扰其重叠的目标特征的处理引起的。总体而言,数据表明,与Kahan和Lichtman一致,OSM可以通过独立目标和蒙版表示之间的竞争来产生。

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